
基本信息 |
部 门: 微电子科学与工程系 职 称: 教授 邮 箱: wangyang@xtu.edu.cn 办公室: 物理楼主楼502 汪洋,女,1981年生,博士,教授,硕士生导师,2015年6月获qy球友会理学博士学位。研究兴趣为高压高防护级别ESD/TVS器件结构设计及机理研究、器件级和电路级建模、TCAD工艺及器件仿真方法研究、全芯片ESD防护设计。主持并完成省级以上项目3项。发表学术论文40篇,其中SCI收录25篇、EI收录会议论文10篇、获湖南省仪器仪表学会优秀论文一等奖2篇。获集成电路布图设计登记10项,授权发明专利12项,授权实用新型专2项。 |
学习工作经历 |
2003—至今 qy球友会 任教 2012—2015 qy球友会 球友会 凝聚态物理专业 攻读博士研究生 2004—2007 qy球友会 球友会 微电子学与固体电子学专业 攻读硕士研究生 |
研究方向 |
先进半导体器件与集成电路技术 |
科研项目 |
[1] 主持,《嵌套型双向可控硅TVS器件及其片上集成技术研究》,国自科基金青年项目(编号:61704145),22万元,2018年1月-2020年12月。 [2] 主持,《车用超高压新型可控硅ESD器件及其维持电压估算模型研究》,湖南省自科基金青年项目(编号:2019JJ50609),5万元,2019年1月-2020年12月。 |
代表性成果(专著、论文和专利等) |
期刊论文: [1] Wenjie Guan, Yang Wang, Zhiqin Deng, Bo Yu, Xijun Chen, Xiangliang Jin, Hongjiao Yang, Investigation on holding voltage of asymmetric DDSCR with floating heavy doping in 0.18 μm CMOS process [J]. Solid-State Electronics,2023, 199(2023): 108486. [2] Shuang Li, Yang Wang, Hongke Tao, Qing Liu, Zhiwen Zeng, Xiangliang Jin, Hongjiao Yang. Resistor-less power-rail ESD clamp circuit design with adjustable NMOS gate biased voltage [J]. 38 (2023): 115010. [3] Yang Wang, Xuebing Su, Xiangliang Jin, Hongjiao Yang, Zijie Zhou. Design, Fabrication and Measurement of LDNMOS-SCR Devices with Appropriate ESD Protection Window for 18V HV CDMOS Process [J]. Journal of Microelectronics, Electronic Components and Materials, 2022, 52(2):83–88. [4] Xuebing Su, Wang Yang, Xiangliang Jin, Hongjiao Yang. A High Performance Normally-Off AlGaNGaN Split-Gate MIS-HEMT Using Piezo Neutralization Technique [J]. Journal of Nanoelectronics and Optoelectronics, 2022, 17(2022):1-9. [5] Su, X., Wang, Y., Jin, X., Yang, H., Zhang, Y., Yang, S. and Yu, B. (2022), A high performance RC-INV triggering SCR under 0.25 µm process [J]. Microelectronics International, Vol. ahead-of-print No. ahead-of-print. https://doi.org/10.1108/MI-04-2022-0069 [6] Yang Wang*, Jieyu Li, DanDan Jia, Weipeng Wei, Analyzing the impact of guard-ring on different dual-direction SCR by device simulation and TLP measurement, Microelectronics Reliability [J]. 2021, DOI: 10.1016/j.microrel.2021.114398. [7] Yang Wang*, Jieyu Li, Weipeng Wei, Pei Cao, Wenmiao Cao, Enhanced asymmetric DDSCR with high robustness for high-voltage ESD protection [J]. International Journal of Electronics Letters, 2021, DOI: 10.1080/21681724.2021.1969435. [8] Weipeng Wei, Yang Wang*, Xijun Chen, Yifei Zheng, Jieyu Li, Pei Cao, Wenmiao Cao. Investigation of Different Conduction States on the Performance of NMOS‑Based Power Clamp ESD Device [J]. Journal of Electrical Engineering & Technology, 2021, 16:1583-1589. [9] Jia,Dandan; Wang,Yang*; Chen, Xijun; Bao, Zhanying; Lu, Jun; Dong, Peng; Design and analysis of a multi-finger dual-direction SCR discharging electro-static current in a gradual transition manner [J]. Semiconductor Science and Technology, 2020, 35(2020):075017-075017. [10] Wang, Yang*; Chen, Xijun; Dong, Peng; Improvement of electrostatic discharge current-handling capability for high-voltage multi-finger nLDMOS devices with self-triggered technique [J]. Semiconductor Science and Technology, 2020, 35(2020):065010-065010. [11] Wang, Yang*; Chen, Xijun; Jia, Dandan; Lu, Jun; Wei, Weipeng; Dong, Peng; The influence of N-type buried layer on SCR ESD protection devices [J]. IEEE Transactions on Device and Materials Reliability, 2020, 20(4):658-666. [12] Li, Jieyu; Wang, Yang*; Jia, Dandan; Wei, Weipeng; Dong, Peng; New embedded DDSCR structure with high holding voltage and high robustness for 12-V applications [J]. Chinese Physics B, 2020, 29(10):108501-108501. [13] Chen, Xijun; Wang, Yang*; Jin, Xiangliang; Zhou, Zijie; Lu, Jun; Jia, Dandan; An ESD robust high holding voltage dual-direction SCR with symmetrical I-V curve by inserting a floating P plus in PWell [J]. Solid-State Electronics, 2019, 160(2019):0-107627. [14] Ding, Liqiang; Wang, Yang*; Bao, Zhanying; Liao, Hanzhang; Jin, Xiangliang; A nano-ampere current reference circuit in a 0.5 μm CDMOS technology [J]. Microelectronics Journal, 2019, 90(2019):336-341. [15] Zheng, Yifei; Jin, Xiangliang; Wang, Yang*; Guan, Jian; Hao, Sanwan; Luo, Jun; Island diodes triggering SCR in waffle layout with high failure current for HV ESD protection [J]. Solid-State Electronics, 2019, 152(2019):17-23. [16] Jin, Xiangliang; Zheng, Yifei; Wang, Yang*; Guan, Jian; Hao, Shanwan; Li, Kan; Luo, Jun; ESD robustness improving for the low-voltage triggering silicon-controlled rectifier by adding NWell at cathode [J]. Solid-State Electronics, 2018, 139(2018):69-74. [17] Jian Guan, Yang Wang*, Shanwan Hao, Yifei Zheng, Xiangliang Jin. A novel high holding voltage dual-direction SCR with embedded structure for HV ESD protection [J]. IEEE Electron Device Letters, 2017, 38(12):1716-1719. [18] Yang Wang,Xiangliang Jin*,Liu Yang,Robust LDMOS with Interleaved Bulk and Source for High-Voltage ESD Protection [J]. IET Power Electronics, 2015, 8(11): 2251-2256. [19] Yang Wang, Xiangliang Jin*, Liu Yang, Qi Jiang,Huihui Yuan,Robust dual-direction SCR with low trigger voltage, tunable holding voltage for high-voltage ESD protection [J]. Microelectronics Reliability, 2015, 55(2015): 520-526. 会议论文: [1] Z. Deng, Y. Wang, Y. Zhang, B. Yu, W. Guan and H. Yang, "ESD Characteristics Improving for DDSCR with NBL by Adding High Voltage N-type Well Isolation in 0.18-μm BCD Technology," 2022 10th International Symposium on Next-Generation Electronics (ISNE), Wuxi, China, 2023, pp. 1-3, doi: 10.1109/ISNE56211.2023.10221621. [2] Xuebing Su, Yang Wang, Xiangliang Jin, Hongjiao Yang. Design of high voltage electrostatic protection device for CAN bus[C]. Journal of Physics: Conference Series, 2022 2nd International Conference on Electronics, Circuits and Information Engineering (ECIE-2022) 07/01/2022 - 09/01/2022, Volume 2221. [3] W. Guan, Y. Wang, B. Yu, Z. Deng and X. Chen, "Layout Geometry Impact on ESD Robustness of Multi-Finger Asymmetric DDSCR Devices," 2022 International EOS/ESD Symposium on Design and System (IEDS), Chengdu, China, 09/11/2022-11/11/2022, pp. 1-6. 发明专利: [1] 汪洋,李婕妤,魏伟鹏,曹佩,曹文苗. 叉指方式的非对称双向可控硅静电释放器件及其制作方法,中国发明专利, 授权号:ZL 2020 1 0741325.0,2023.8.22. [2] 杨浩泽,汪洋,杨红姣,窄设计窗口的对称双向可控硅静电防护器件及其制作方法,中国发明专利, 授权号:ZL 2020 1 0193302.0,2023.4.11. [3] 汪洋,苏雪冰,杨帅康,杨红姣,邓志勤. MIS分裂栅GaN基高电子迁移率晶体管及其制备方法,中国发明专利, 授权号:ZL 2021 1 0695398.5,2022.5.17. [4] 汪洋; 陈锡均; 夹丹丹; 芦俊; 周子杰, 一种内嵌P+ 注入区分段型非对称可控硅静电释放器件, 中国, 发明专利, ZL 2019 1 1118001.5. [5] 汪洋; 夹丹丹; 杨红姣; 芦俊, 一种高防护等级双向可控硅静电防护器件及其制作方法, 中国, 发明专利, ZL 2018 1 0578171.0. [6] 汪洋; 陈锡均; 周子杰, 一种低压触发高维持电压可控硅整流器静电释放器件, 中国, 发明专利, ZL 2018 1 0578320.3. [7] 汪洋; 关健; 金湘亮, 一种嵌套型多指双向可控硅静电防护器件, 中国, 发明专利, ZL 2017 1 0924403.9. 集成电路布图设计登记: [1] 汪洋,杨帅康. 应用于高压总线端口的对称双向可控硅静电防护器件版图,集成电路设计布图设计登记号:BS.21567474X,2022.6.2. [2] 汪洋,曹佩. 一种内嵌技术NPN管的双向对称可控硅静电防护器件,中国,集成电路布图设计登记号:BS.205562310. [3] 汪洋,李婕妤,一种嵌套型非对称双向可控硅静电保护器件,中国,集成电路布图设计登记,BS.205562299. |
荣誉奖励 |
[1] 汪洋,周子杰,董鹏,张继文,黄晖,瞬态电压抑制静电保护器件关键技术及应用,湖南省科技进步三等奖,2020年。 [2] 金湘亮,汪洋,谢亮,杨红姣,崔杨,刘航,马铭磷,高压工艺用芯片级集成的静电释放器件新技术与应用,湖南省科技进步奖三等奖,2015年。 |